Development of all-around, SiO2/Al2O3 gate, suspended silicon nanowire chemical field effect transistors Si-nw-ChemFET

نویسندگان

  • Ahmet Lale
  • Auriane Grappin
  • David Bourrier
  • Laurent Mazenq
  • Aurélie Lecestre
  • Jérôme Launay
  • Pierre Temple-Boyer
  • Ahmet LALE
  • Auriane GRAPPIN
  • Laurent MAZENQ
  • David BOURRIER
  • Aurélie LECESTRE
  • Jérôme LAUNAY
چکیده

We present a sensor platform associated to silicon-nanowire chemical field effect transistors (Sinw-ChemFET). Innovations concern the use of networks of suspended silicon N+/P/N+ nanowires as conducting channel, the realization by thermal oxidation and Atomic-Layer Deposition (ALD) of a SiO2/Al2O3 gate insulator all-around the silicon nanowires, and their final integration into covered SU8-based microfluidic channels. The Si-nw-MOSFET/ChemFET fabrication process and electrical/electrochemical characterizations are presented. The fabrication process did not need an expensive and time-consuming e-beam lithography, but only fast and “low cost” standard photolithography protocols. Such microdevice will provide new opportunities for bio-chemical analysis at the micro/nanoscale.

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تاریخ انتشار 2017